Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
filingDate |
2001-02-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_771fb78002a366d5b28d400dbb5cd4ab http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a085f16a061ec31d16a3d53c01440b41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_58404e62c622227e94ce4419894e49c7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dd3970fed25147209b879a77e08db83e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_072f7eb3d47d2cbef459ecda0683d10e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2a2065948fc4e951b67b8804eebe0c3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0da5708bb45d88b87a655a2817fdc610 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a386a412a55181ad4c8694ab7463c56 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b323ca932761660558e67c43db689b4 |
publicationDate |
2003-01-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-2003003391-A1 |
titleOfInvention |
High resolution photoresist compositions |
abstract |
The invention provides photoresists and resist preparative methods. Methods of the invention include treatment of a resist resin with methylene chloride or other organic solvent to remove low molecular weight materials. It has been found that the treated resin can be formulated into resists that provide manufactured electronic devices with significantly reduced defects. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9817311-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2015048051-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9417527-B2 |
priorityDate |
2000-02-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |