| abstract |
A low residue antimicrobial solution containing about 0.2 percent by weight of an acid selected from the group consisting of organocarboxylic acids; and about 2 percent of a volatile solvent selected from the group consisting of n-butanol, benzyl alcohol, phenylethanol, and sparingly soluble glycol ether solvents is disclosed. Preferred compositions may also contain about 0.1 percent anionic sulfated or sulfonated surfactants and about 5 percent co-solvent selected from the group consisting of completely water soluble monoprotic aliphatic alcohols and glycol ethers. The solution may be also employed as a low-residue cleaner for soiled hard surfaces. |