| Predicate |
Object |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2002-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_47e03d4a8cb8a76d1cdfc6b7feab68b6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_92c5fb9c47fbd093c24109761ed49fb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1cbf295b52a14915ce3983fbfbf88ed3 |
| publicationDate |
2002-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002155378-A1 |
| titleOfInvention |
Chemical amplifying type positive resist compositions |
| abstract |
A chemical amplifying type positive resist composition having resolution and sensitivity that are well balanced, undergoing a minimum of shrinkage due to the irradiation with electron rays of SEM, and comprising a resin that has a polymerization unit derived from an unsaturated monomer expressed by the following formula (1) and that itself is insoluble in an alkali but becomes alkali-soluble due to the action of an acid; and an acid generating agent: n n n wherein R 1 and R 2 each independently represents hydrogen or a methyl group, is provided. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7218126-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6952105-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006028218-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005099189-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003211734-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6924079-B2 |
| priorityDate |
2001-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |