http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002146644-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_01dc8a8a3ae90ebd3658b65c494e2a4d |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-145 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2201-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-368 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-262 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-24 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C2210-06 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41C1-1016 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41N1-14 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-36 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41C1-10 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41N1-14 |
| filingDate | 2002-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df302bff60210422c92c52568a155023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c4cee8907c3ebad1b487d8110883e500 |
| publicationDate | 2002-10-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2002146644-A1 |
| titleOfInvention | Positive-working lithographic printing plate precursors |
| abstract | A positive-working printing plate precursor for wet lithographic printing is disclosed which comprises a support having a hydrophilic surface and a coating comprising a first layer closest to the support, said first layer containing an oleophilic phenolic resin soluble in an aqueous alkaline developer, and a second layer containing an amphyphilic polymer, wherein n (a) the second layer is capable of preventing the aqueous alkaline developer from penetrating into the first layer to an extent that substantially no dissolution of unexposed coating occurs upon immersion in the aqueous alkaline developer during a time period t 2 ; n (b) and wherein said capability of the second layer of preventing the aqueous alkaline developer from penetrating into the first layer is reduced upon exposure to heat or light to an extent that substantially complete dissolution of exposed coating occurs upon immersion in the aqueous alkaline developer during a time period t 1 ; n wherein t 2 >t 1 and t 2 −t 1 is at least 10 seconds; and n wherein the amphyphilic polymer is a block- or graft-copolymer comprising (i) a poly(alkylene oxide) block and (ii) a block comprising siloxane and/or perfluorohydrocarbon units. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110493533-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006001849-A1 |
| priorityDate | 2001-04-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 96.