| abstract |
A photosensitive polymer of a resist composition includes a copolymer of alkyl vinyl ether containing silicon and maleic anhydride, represented by the following formula: n n n where R 1 is —H, —OSi(CH 3 ) 2 C(CH 3 ) 3 or —OSi(CH 3 ) 3 ; R 2 is —H, —OH, —OCOCH 3 , —OSi(CH 3 ) 2 C(CH 3 ) 3 or —OSi(CH(CH 3 ) 2 ) 3 ; R 3 is —H, —OH or —OCOCH 3 ; R 4 is —H, —OSi(CH 3 ) 2 C(CH 3 ) 3 , —CH 2 OSi(CH 3 ) 2 C(CH 3 ) 3 or —CH 2 OSi(CH(CH 3 ) 2 ) 3 ; and at least one of R 1 , R 2 , R 3 and R 4 is a Si-containing group. |