| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e415f6f1eeb8706d299ea086326248bf |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09 |
| filingDate |
2001-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_50479a1b830b8f128fbd86a3fd107894
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5f3307597a40fe564ae534d960ff2a7e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10065d9dfec8f2a931132838dab2c327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ef48a2a238ede619f4cfdf216359d71 |
| publicationDate |
2002-10-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002142246-A1 |
| titleOfInvention |
Reduction of inorganic contaminants in polymers and photoresist compositions comprising same |
| abstract |
The present invention provides polymers which are substantially or completely free of inorganic contaminants and the use of such polymers as a resin component for photoresist compositions, particularly chemically-amplified positive-acting resists. Polymers of the invention also are suitable for use as a resin component for antireflective coating compositions (ARCs). More particularly, the invention provides methods for reducing such contaminants in polymerization initiators, particularly free radical initiators. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2015033879-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010040838-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015049508-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011072307-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010203299-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009253081-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009253080-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010183851-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8084186-B2 |
| priorityDate |
2000-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |