| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-24331 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-095
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00619
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D1-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C25D5-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C99-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-095 |
| filingDate |
2001-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09696358f99632da50ddff82a4f6ca91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3ca7234114fe129e03b2b58b8a71f482 |
| publicationDate |
2002-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002122918-A1 |
| titleOfInvention |
Multiple wavelength photolithography for preparing multilayer microstructures |
| abstract |
The invention relates to a multilayer microstructure and a method for preparing thereof. The method involves first applying a first photodefinable composition having a first exposure wavelength on a substrate to form a first polymeric layer. A portion of the first photodefinable composition is then exposed to electromagnetic radiation of the first exposure wavelength to form a first pattern in the first polymeric layer. After exposing the first polymeric layer, a second photodefinable composition having a second exposure wavelength is applied on the first polymeric layer to form a second polymeric layer. A portion of the second photodefinable composition is then exposed to electromagnetic radiation of the second exposure wavelength to form a second pattern in the second polymeric layer. In addition, a portion of each layer is removed according to the patterns to form a multilayer microstructure having a cavity having a shape that corresponds to the portions removed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006234168-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8383323-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-3777994-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GR-1005410-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2008076068-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11613115-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2011139445-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8187786-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11175279-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005014364-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2014048508-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1835050-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-2566598-B1 |
| priorityDate |
2001-03-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |