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filingDate 2001-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2002-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2002119250-A1
titleOfInvention Method of depositing low dielectric constant silicon carbide layers
abstract A method of forming a silicon carbide layer for use in integrated circuits is provided. The silicon carbide layer is formed by reacting a gas mixture comprising a silicon source, a carbon source, and a nitrogen source in the presence of an electric field. The as-deposited silicon carbide layer incorporates nitrogen therein from the nitrogen source.
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