http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002104467-A1

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publicationDate 2002-08-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-2002104467-A1
titleOfInvention Accelerated plasma clean
abstract A method and apparatus that reduces the time required to clean a processing chamber employing a reactive plasma cleaning process. A plasma is formed in an Astron fluorine source generator from a flow of substantially pure inert-source gas. After formation of the plasma, a flow of a fluorine source gas is introduced therein such that the fluorine source flow accelerates at a rate no greater than 1.67 standard cubic centimeters per second 2 (scc/s 2 ). In this fashion, the plasma contains a plurality of radicals and dissociated inert-source gas atoms, defining a cleaning mixture. The ratio of inert-source gas to fluorine source is greater than 1:1.
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