| abstract |
A polymer comprising recurring units of formula (1-1) or (1-2) wherein R 1 and R 2 are H or C 1-15 alkyl, R 1 and R 2 , taken together, may form a ring; R 3 is H, C 1-15 alkyl, acyl or alkylsulfonyl or C 2-15 alkoxycarbonyl or alkoxyalkyl which may have halogen substituents, not all R 1 , R 2 and R 3 are hydrogen; and k=0 or 1, and having a Mw of 1,000-500,000 is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV. |