| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_81cfb88d909c75104c0c8d61799a72b0 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-108
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-104
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2253-102
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-706
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-40096
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-0446
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2256-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-40098 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-64
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-20 |
| filingDate |
2001-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1651255ce2e85b37e7538a7dc17b7736
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4441645069dfb6983895685156f30a2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_728c77721e1a707b77c4cce75dbe14b9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef00b894042cc0b574c521d443c6e9a6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8f6a72457d6177eb5e294ead799c9238 |
| publicationDate |
2002-07-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002094380-A1 |
| titleOfInvention |
Abatement of effluents from chemical vapor deposition processes using organometallicsource reagents |
| abstract |
A method and apparatus for abatement of effluent from a CVD process using a source reagent having a metal organic loosely bound to a organic or organomettalic molecule such that upon exposure to heat such bond is readily cleavable, e.g., copper deposition process involving the formation of films on a substrate by metalorganic chemical vapor deposition (CVD) utilizing a precursor composition for such film formation. The abatement process in specific embodiments facilitates high efficiency abatement of effluents from copper deposition processes utilizing Cu(hfac)TMVS as a copper source reagent. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005056148-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003056726-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1637208-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11396699-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7364603-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022333238-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6833024-B2 |
| priorityDate |
1999-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |