http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002043300-A1
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_242cc8d15c771395b920cc7de452da6a |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C8-24 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C8-24 |
| filingDate | 2001-07-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ce09359bcb520a9e8c9b1b822e22efe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94519bd05d589ab7650ba94fb4d1fb91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df135e19e481ca1fabbca2ce0400c709 |
| publicationDate | 2002-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-2002043300-A1 |
| titleOfInvention | Process and an apparatus for nitriding an aluminum-containing substrate |
| abstract | When a nitride film is formed on a substrate containing at least metallic aluminum, a fluctuation in forming a nitride film can be prevented, or the formation of the nitride film can be accelerated. A substrate containing at least metallic aluminum is subjected to a heating treatment in vacuum of 10 −3 torrs or less, and subsequently it is subjected to a heating/nitriding treatment in an atmosphere ( 5 ) containing at least nitrogen. During the heating/nitriding treatment, porous bodies ( 3 ) and ( 4 ) through which nitrogen atoms-containing gases (A) and (B) can flow are contacted with the atmosphere ( 5 ). |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113416916-A |
| priorityDate | 2000-07-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.