| Predicate |
Object |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-111 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D207-46
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L101-10
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2001-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ee4f963fa29d2ba7b7b0673250a24c0c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_be156ba532aea0d0f5d1665e517b18e6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5244d6d03fc3fecadf03e19d379ff32f
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_517002424e0de90bebf2c33ab5515a73 |
| publicationDate |
2002-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2002012872-A1 |
| titleOfInvention |
Radiation-sensitive resin composition |
| abstract |
A positive-type radiation-sensitive resin composition is provided. The composition includes: n (A) a low-molecular compound comprising a compound having at least one amino group having one or two hydrogen atom(s) bonded to the nitrogen atom; at least one hydrogen atom the amino group has having been substituted with a t-butoxycarbonyl group; n (B) a radiation-sensitive acid generator; and n (C) a silicon-atom-containing resin comprising an alkali-insoluble or alkali-slightly-soluble resin having been protected with an acid-cleavable group; the resin being capable of turning soluble in alkali upon cleavage of the acid-cleavable group. This radiation-sensitive resin composition is effectively responsive to radiations of various types, has superior sensitivity and resolution and also a superior long-term storage stability, and is useful as a positive-type chemically amplified resist. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101026948-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2014329177-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6623907-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2007032082-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006263540-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006260545-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9182666-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7429532-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-9120288-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10947393-B2 |
| priorityDate |
2000-06-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |