| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e5db580deca7130dbe51805c6c608b35 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y30-00 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-38
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-09
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 |
| filingDate |
2001-02-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b5723461c7558a5980085e8a2d52a7f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02602d7bf4a6b83c0a7c1feabedae8f0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c5449c89cc04802829a553be9f528a0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad60b78d1616f3cba147e2333490c4a0 |
| publicationDate |
2001-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2001036594-A1 |
| titleOfInvention |
Resist composition for use in chemical amplification and method for forming a resist pattern thereof |
| abstract |
Disclosed is a negative resist composition comprising an alkaline-soluble resin and a compound having an oxetane structure. This composition further comprises an acid generator and provides a fine resist pattern with high sensitivity at a wavelength of less than 200 nm. The resist composition can be used in both monolayer and bilayer resist methods, thereby meeting the requirements for high sensitivity at a shorter wavelength and etching resistance. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8859187-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010230383-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010233514-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8070968-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005089792-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005106494-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8551685-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009191478-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010230384-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010237041-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8372575-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010203445-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6939664-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8173029-B2 |
| priorityDate |
2000-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |