| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05C9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6715
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D1-286 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C9-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05D1-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B05C11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-00 |
| filingDate |
2001-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3abfedc7a32bd8e59de4c793015d863e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5abf4d4aa032342cfc20e3a508db8631
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7843331633f0c28521e505f0f4fcb04c |
| publicationDate |
2001-10-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-2001033894-A1 |
| titleOfInvention |
Substrate processing method and substrate processing apparatus |
| abstract |
After a thin liquid agent film is formed by supplying a liquid agent onto a plate-like developer holder, this liquid agent film and the surface of a substrate are opposed. The liquid agent film and the substrate are brought into contact with each other at a point by declining the substrate and moving it close to the liquid agent film, or by curving the substrate toward the liquid agent film. Then, the substrate is made parallel to the liquid agent film, and the liquid agent is supplied such that the contact area of the liquid agent film spreads over the entire surface by the interfacial tension between the liquid agent film and the substrate. Since a thin liquid agent film can be uniformly formed below the substrate, processing can be performed with a small consumption amount. Additionally, the liquid agent can be supplied to the substrate without holding air. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009029288-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-111822277-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003011108-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7767378-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105291545-A |
| priorityDate |
2000-03-15-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |