abstract |
A polymer comprising recurring units of formula (1) and having a Mw of 1,000-500,000 is provided. n n n R 1 is H, methyl or CH 2 CO 2 R 3 , R 2 is H, methyl or CO 2 R 3 , R 3 is alkyl, R 4 is H, alkyl, alkoxyalkyl or acyl, R 5 and R 15 are acid labile groups, and at least one of R 6 to R 9 is a carboxyl or hydroxyl-containing monovalent hydrocarbon group, and the reminders are H or alkyl, at least one of R 10 to R 13 is a monovalent hydrocarbon group containing a —CO 2 — partial structure, and the reminders are H or alkyl, R 14 is a polycyclic hydrocarbon group or polycyclic hydrocarbon-containing alkyl group, Z is a trivalent hydrocarbon group, k=0 or 1, x is>0, a, b, c and d are ≧0, satisfying x+a+b+c+d=1. A resist composition comprising the polymer has significantly improved sensitivity, resolution and etching resistance and is very useful in microfabrication. |