| abstract |
A method of forming a silicon nitride thin film by using a PECVD process, in which a silicon nitride thin film is formed according to the PECVD process a temperature range of about 550 to 700° C. by using plasma maintained by a high frequency power in the range of about 200 to 1000 W. Plasma can be generated by using a mixed gas of SiH 4 , NH 3 and N 2 . According to the invention, a hot temperature process is associated with the PECVD process so that the silicon nitride thin film of the invention can be free from problems of the silicon nitride thin films formed by the PECVD process and the LPCVD process. |