| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6aa5d7ca33a7b0f521e58f3748214410 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2255-9155
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J37-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-2045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-2047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-708
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-406
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2251-10 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45534
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-8696
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D46-0027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J35-0006
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-86
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45502
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-9418
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4412
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01J35-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J37-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-94
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-00 |
| filingDate |
2021-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2023-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23bfda88165948396172199afa81c146
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a5f7274246d66041242e63df82d3e344
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2c76f7132c7fd4665d69e91ff4102b4c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8b9a08910a06f46762147c2d3e98afc2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b3a97fb88c9aff7b2574adb03ff1e12d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e07bd7c8bb6a453318c1334e17ec9a74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9baa05e200414f4437f30925fd684a40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2fd7b7d4049323bc1c562fb56cc0370
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1001cdbf4f0eddd81edafaa33d1ee480 |
| publicationDate |
2023-01-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11549178-B2 |
| titleOfInvention |
Apparatus for treating semiconductor process gas and method of treating semiconductor process gas |
| abstract |
An apparatus and method for treating a semiconductor process gas comprises a gas inlet allowing a treatment target gas (or gas to be treated) to flow therethrough; a catalytic reaction portion including a catalyst and configured to allow the treatment target gas to be brought into contact with the catalyst; a space velocity controller between the gas inlet and the catalytic reaction portion, the space velocity controller extending from the gas inlet in a diagonal direction in relation to the gas inlet; a differential pressure buffer portion between the space velocity controller and the catalytic reaction portion and including a filter; and a gas outlet configured to externally discharge a product formed as the treatment target gas comes into contact with the catalyst. |
| priorityDate |
2020-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |