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filingDate 2021-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2022-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11527411-B2
titleOfInvention Interconnect structure having a carbon-containing barrier layer
abstract An interconnect structure and a method of forming an interconnect structure are disclosed. The interconnect structure includes a conductive plug over a substrate; a conductive feature over the conductive plug, wherein the conductive feature has a first sidewall, a second sidewall facing the first sidewall, and a bottom surface; and a carbon-containing barrier layer having a first portion along the first sidewall of the conductive feature, a second portion along the second sidewall of the conductive feature, and a third portion along the bottom surface of the conductive feature.
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