Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-24 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D303-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07D303-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F228-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-382 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07D303-06 |
filingDate |
2020-02-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2022-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a13a8057c816466672a1370dfdbb32f6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a983d8c12d9fa2e0546cdfc44737befb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94be320ab77e8e1113b2306ca0a89a14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6d064034bd5381a006b4b617df80f610 |
publicationDate |
2022-11-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-11492337-B2 |
titleOfInvention |
Epoxy compound, resist composition, and pattern forming process |
abstract |
An epoxy compound of formula (1) is provided. A resist composition comprising the epoxy compound is capable of adequately controlling the diffusion length of acid generated from an acid generator without sacrificing sensitivity. |
priorityDate |
2019-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |