| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c16d2144a81bfa32a665dca1e93c3d37 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-3341
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32136
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3244
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32449
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32568 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3213 |
| filingDate |
2019-10-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6c2ffd4382e0e598f860629ed17bee43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2212178a86466fe090ca4a62288e27e8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e6ea0a90d8e5a394c70211a296083d37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df15e157e0609a8c47159a4094c95ba2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb4859501718d96ad5850fcb0501acbc |
| publicationDate |
2022-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11488804-B2 |
| titleOfInvention |
Shower head assembly and plasma processing apparatus having the same |
| abstract |
A shower head assembly for a plasma processing apparatus in which a substrate is accommodatable on a substrate stage within a chamber, a plasma processing apparatus, and a plasma processing method, the shower head assembly including a shower plate including a plurality of injection holes through which a gas is sprayable out toward the substrate; and a compensation plate on a lower surface of the shower plate and facing the substrate, the compensation plate including a first compensating portion having first gas passages of a first length and a second compensating portion having second gas passages of a second length that is greater than the first length, wherein the first gas passage and the second gas passage are respectively in fluid communication with the injection holes. |
| priorityDate |
2019-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |