Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_20688220cab72ad01902ff5223732946 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S148-051 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-061 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M7-0009 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0047 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M7-0081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M3-006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-104 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-102 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-1241 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-17 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-105 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-38 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-107 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-104 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-103 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-102 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-101 |
filingDate |
2017-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2022-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3b63bf13e87779d35b730e39b31d9ead http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_509e34fa0c7c7bc5a22a50ec3efc78f4 |
publicationDate |
2022-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-11466166-B2 |
titleOfInvention |
Etch-resistant inkjet inks for manufacturing printed circuit boards |
abstract |
A radiation curable inkjet ink including an adhesion promoter including (1) at least one a free radical polymerizable group selected from the group consisting of an acrylate, a methacrylate, an acryl amide and a methacryl amide; (2) at least one aliphatic tertiary amine; and (3) at least one carboxylic acid or salt thereof with the proviso that the carboxylic acid is linked to an aliphatic tertiary amine via a divalent linking group selected from the group consisting of an optionally substituted methylene group and an optionally substituted ethylene group. |
priorityDate |
2016-09-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |