http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11434391-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 |
| filingDate | 2019-09-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2022-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8e4d293290613adf2de19805008c274 |
| publicationDate | 2022-09-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-11434391-B2 |
| titleOfInvention | Polishing composition, polishing method, and method of producing substrate |
| abstract | Provided are a polishing composition capable of effectively reducing or eliminating a step difference on a surface of an object to be polished consisting of a single material, a method of using such a polishing composition, and a method of producing a substrate.The polishing composition of the present invention contains an abrasive grain, a pH adjusting agent, a dispersing medium, and at least one kind of first water-soluble polymer having a lactam structure and at least one kind of second water-soluble polymer containing an alkylene oxide represented by the following Formula (I) in the structure,CxH2xOn (I)(in the Formula (I), X is an integer of 3 or more and n is an integer of 2 or more.). |
| priorityDate | 2018-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 104.