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filingDate 2018-10-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2022-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11408075-B2
titleOfInvention Batch curing chamber with gas distribution and individual pumping
abstract Embodiments of the present disclosure generally relate to a batch processing chamber that is adapted to simultaneously cure multiple substrates at one time. The batch processing chamber includes multiple processing sub-regions that are each independently temperature controlled. The batch processing chamber may include a first and a second sub-processing region that are each serviced by a substrate transport device external to the batch processing chamber. In addition, a slotted cover mounted on the loading opening of the batch curing chamber reduces the effect of ambient air entering the chamber during loading and unloading.
priorityDate 2014-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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