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filingDate 2020-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c8349c1da77e881a1915520cd8556699
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publicationDate 2022-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11387364-B2
titleOfInvention Transistor with phase transition material region between channel region and each source/drain region
abstract A transistor includes a semiconductor substrate, a first source/drain region and a second source/drain region in the semiconductor substrate with a channel region between the source/drain regions, and a gate over the channel region. In addition, the transistor includes a first phase transition material (PTM) region between the first source/drain region and the channel region, and a second PTM region between the second source/drain region and the channel region. The PTM regions provide the transistor with improved off-state current (I OFF ) without affecting the on-state current (I ON ), and thus an improved I ON /I OFF ratio. The transition threshold of PTM regions from dielectric to conductor can be customized based on, for example, PTM material type, doping therein, and/or strain therein.
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