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filingDate 2020-04-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_343a54b5f8b11a2407c078a0dfec88c0
publicationDate 2022-07-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11377723-B2
titleOfInvention Method of patterning quantum dots, device using same, and system thereof
abstract A method of patterning quantum dots, a device using same, and a system thereof are provided. By providing a base between a plurality of upper electrodes and a plurality of lower electrodes, coating a quantum dot solution on an upper surface of the base, and powering the upper electrodes and the lower electrodes to form an electric field between the upper electrodes and the lower electrodes, the quantum dot solution is gathered between the upper electrodes and the lower electrodes according to an electric field distribution. Subsequently, the quantum dot solution can be deposited into a film by evaporation of a solvent, thereby obtaining a patterned quantum dot thin film on the base.
priorityDate 2020-03-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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