| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c3a2f00e72ba6e4c09b6da573427fbed |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-91
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-08 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L49-02 |
| filingDate |
2019-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a77533764e98f4bb9fd5fa6c697fb9b8
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_66a2a8c146c61cbbffb1f9cfba5ecf58
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ef4a16c3293c9c697deccd5c08c8021a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8601c04d1276d839f8f1d14c7ec17e7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2beda7338cae10c48495bf358b5c02f7 |
| publicationDate |
2022-06-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11361972-B2 |
| titleOfInvention |
Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide |
| abstract |
Some embodiments include a method in which an assembly is formed to have a first silicon-dioxide-containing-material and a second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material has a higher concentration of dopant therein than does the second silicon-dioxide-containing-material. The first silicon-dioxide-containing-material is selectively removed relative to the second silicon-dioxide-containing-material using a mixture which includes hydrofluoric acid, a second acid and an organic solvent. The organic solvent may include at least one ester and/or at least one ether. The second acid may have a pKa of less than about 5. |
| priorityDate |
2019-04-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |