Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1446e3b83ab7ebbb0c0de28515c743a6 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-6025 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-945 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2223-54426 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B2235-658 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2223-54493 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02035 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-2003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02021 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B28D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B41-53 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02389 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-6455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02013 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C04B35-581 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-04 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-544 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L29-20 |
filingDate |
2020-07-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2022-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bf12f7da059b9be2edb052dac2581809 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2cc26777cfc314797afb14c15860d695 |
publicationDate |
2022-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-11355448-B2 |
titleOfInvention |
Method for making aluminum nitride wafer and aluminum nitride wafer made by the same |
abstract |
The present invention provides an aluminum nitride wafer and a method for making the same. The method includes forming at least one alignment notch in or at least one flat alignment edge on a periphery of the aluminum nitride wafer. The alignment notch and the flat alignment edge can prevent the aluminum nitride wafer from being in a poor state during the semiconductor manufacturing process and makes it possible to position the aluminum nitride wafer precisely so that the fraction defective can be lowered. The aluminum nitride wafer of the present invention has advantages of effective insulation, efficient heat dissipation, and a high dielectric constant, and can be used in semiconductor manufacturing processes, electronic products, and semiconductor equipment. |
priorityDate |
2020-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |