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filingDate 2020-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2022-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11348825-B2
titleOfInvention Method and device for surface treatment of substrates
abstract A method for surface treatment of an at least primarily crystalline substrate surface of a substrate such that by amorphization of the substrate surface, an amorphous layer is formed at the substrate surface with a thickness d>0 nm of the amorphous layer. This invention also relates to a corresponding device for surface treatment of substrates.
priorityDate 2014-06-24-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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