| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_65aa22bcc8da87a6c99b46e5dc8b28eb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c19a91365ed494d9fe27d24190d4459f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31127
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30655
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6836
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68327
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-6834
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2221-68381 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02282
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-6886
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D167-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B23K26-36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3086
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-6835
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3065
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-189
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-672
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G63-199 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D167-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-683
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-183
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G63-189 |
| filingDate |
2020-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_79684a58b1736956921935ab2bb9bcf0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6a1f95472eaddb010d1c178f73bb4c92
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_94c38f8dcf2f8bea065fb521b14e8888
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f91275c23a3adad92ac3f09357ce7cd7 |
| publicationDate |
2022-05-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11319458-B2 |
| titleOfInvention |
Method for fabricating semiconductor device chips and protective composition |
| abstract |
A protective composition contains a water-soluble polyester resin including a polyvalent carboxylic acid residue and a polyvalent alcohol residue. The polyvalent carboxylic acid residue includes: a polyvalent carboxylic acid residue having a metal sulfonate group; and a naphthalene dicarboxylic acid residue. The proportion of the polyvalent carboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 25 mol % to 70 mol %. The proportion of the naphthalene dicarboxylic acid residue to the polyvalent carboxylic acid residue falls within the range from 30 mol % to 75 mol %. |
| priorityDate |
2020-03-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |