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filingDate 2019-02-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e377eba06a1f877806ccfcece559eb32
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publicationDate 2022-03-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11282919-B2
titleOfInvention Semiconductor device
abstract A semiconductor device that includes a SiC semiconductor substrate; a SiC epitaxial layer having an impurity concentration lower than that of the SiC semiconductor substrate; a first semiconductor layer including first semiconductor pillars and second semiconductor pillars; a second semiconductor layer; a device active region; a termination region; a channel stopper region having an impurity concentration higher than that of the SiC epitaxial layer; and a plurality of first chip end portions and a plurality of second chip end portions, and a surface of the first side surface is covered with an impurity region having an impurity concentration higher than those of the first semiconductor pillar and the SiC epitaxial layer and is connected to the channel stopper region.
priorityDate 2018-02-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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