| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_51d028c578ae85cb937b5b34a5129fbc |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F20-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G83-003
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G83-005 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F20-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G83-00 |
| filingDate |
2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_67111c0c1f02a380ff61e7869dac3f15
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f5e6ce13ba3831a297fb2cb72315af8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a86dfb649bada6d786c2f7c9502b577
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_37062fffc62d7f358b1080d748a6d46a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7a3aedc7efc2332ba6af5e4ab26b8103 |
| publicationDate |
2022-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11262654-B2 |
| titleOfInvention |
Chain scission resist compositions for EUV lithography applications |
| abstract |
Chain scission resist compositions suitable for EUV lithography applications may include monomer functional groups that improve the kinetics and/or thermodynamics of the scission mechanism. Chain scission resists may include monomer functional groups that reduce the risk that leaving groups generated through the scission mechanism may chemically corrode processing equipment. |
| priorityDate |
2019-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |