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filingDate 2019-12-10-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_181df3d516ee853842ba3549f0a4855f
publicationDate 2022-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11257958-B2
titleOfInvention Thin film transistor and manufacturing method thereof
abstract The present invention provides a thin film transistor and a manufacturing method thereof. The thin film transistor includes a substrate, a gate electrode, a gate insulating layer, a semiconductor layer, a source electrode and a drain electrode, and a passivation layer. Both structures of the source electrode and the drain electrode are a three-layered metal structure, and the three-layered metal structure is a titanium tantalum/copper/titanium tantalum structure. Therefore, after the passivation layer is applied to the source electrode and the drain electrode, a bulging problem of the passivation layer can be effectively improved, and thus the thin film transistor has better plasticity and can be used for flexible displays.
priorityDate 2019-11-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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