| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bce787970b69aeb08d159e7c101c9ed7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-3407
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-165
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-24
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0036
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-0652
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-52
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-352 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
| filingDate |
2020-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2022-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5c9f938e113d682bf475a1869223964b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_02aadf67b9eb1d1a0aa07cfd221175de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9a871e54f0a7b8a7272d19fcb580175d |
| publicationDate |
2022-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11237473-B2 |
| titleOfInvention |
Physical vapor deposition system and processes |
| abstract |
A physical vapor deposition (PVD) chamber and a method of operation thereof are disclosed. Chambers and methods are described that provide a chamber comprising an upper shield with two holes that are positioned to permit alternate sputtering from two targets. A process for improving reflectivity from a multilayer stack is also disclosed. |
| priorityDate |
2019-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |