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filingDate 2019-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2022-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_747f3b5c89661bee6c0c6b1f78b63cbf
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publicationDate 2022-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11230759-B2
titleOfInvention Method for producing deposition mask, deposition mask, and method for producing organic semiconductor device
abstract A method for manufacturing a vapor deposition mask including a resin layer, and a magnetic metal body formed on the resin layer, the method including the steps of: (A) providing a magnetic metal body having at least one first opening; (B) providing a substrate; (C) forming a resin layer by applying a solution including a resin material or a varnish of a resin material on a surface of a substrate, and then performing a heat treatment thereon; (D) securing the resin layer formed on the substrate on the magnetic metal body so as to cover the at least one first opening; (E) forming a plurality of second openings in a region of the resin layer that is located in the at least one first opening of the magnetic metal body; and (F) after the step (E), removing the substrate from the resin layer.
priorityDate 2017-01-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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