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filingDate 2018-08-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-12-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11192282-B2
titleOfInvention Template, template manufacturing method, and semiconductor device manufacturing method
abstract According to one embodiment, a template for imprint patterning processes comprises a template substrate having a first surface and a pedestal on the first surface of the template substrate, the pedestal having a second surface spaced from the first surface in a first direction perpendicular to the first surface. A pattern is disposed on the second surface. The pedestal has a sidewall between the first surface and the second surface that is at an angle of less than 90° to the second surface.
priorityDate 2018-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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