| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2068
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2003 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-265
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-43
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-3703
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2082
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2079
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D3-2075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D1-008
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D3-37
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
| filingDate |
2019-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_050440a29423592d516e200f9e73e692
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cfcbea7b62c2c8449da55d2cca7dd61c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_07458a857328a0caff5612a65cc43005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_99620ba9126faebbbfefc6bf127a56ef
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0b83e95d039f4eac5a5c73c108496f8d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_24b48c50c79f702db91f75cdb7bb66ef |
| publicationDate |
2021-07-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11053457-B2 |
| titleOfInvention |
Cleaning composition for semiconductor substrate |
| abstract |
A composition for cleaning a semiconductor substrate contains: a novolak resin; an organic acid not being a polymeric compound; and a solvent. A solid content concentration of the composition is no greater than 20% by mass. The organic acid is preferably a carboxylic acid. The carboxylic acid is preferably a monocarboxylic acid, polycarboxylic acid or a combination thereof. The molecular weight of the organic acid is preferably from 50 to 500. The content of the organic acid with respect to 10 parts by mass of the novolak resin is preferably from 0.001 parts by mass to 10 parts by mass. The solvent includes preferably an ether solvent, an alcohol solvent, or a combination thereof. The proportion of the ether solvent, the alcohol solvent, or the combination thereof in the solvent is preferably no less than 50% by mass. |
| priorityDate |
2017-04-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |