| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0133
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B2201-0257
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C2201-0132
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04R2201-003 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00166
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04R17-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H04R31-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B3-0021
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B7-0025
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L41-047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00531
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00349
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81C1-00539
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B81B7-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L41-29
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10N30-2047 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81B3-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B81C1-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L41-29 |
| filingDate |
2019-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate |
2021-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_32f6a67b1b38dc1f49b1b260fd966c31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cbbb6319268aa15d188e9c5c77fb0a36
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f08b0ee57da2fc8885f52c176617990e |
| publicationDate |
2021-06-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
US-11050012-B2 |
| titleOfInvention |
Method to protect electrodes from oxidation in a MEMS device |
| abstract |
In some embodiments, the present disclosure relates to a method for forming a microelectromechanical system (MEMS) device, including depositing a first electrode layer over a first piezoelectric layer. A hard mask layer is then deposited over the first electrode layer. A photoresist mask is formed on the hard mask layer with a first-electrode pattern. Using the photoresist mask, a first etch is performed into the hard mask layer to transfer the first-electrode pattern to the hard mask layer. The photoresist mask is then removed. A second etch is performed using the hard mask layer to transfer the first-electrode pattern to the first electrode layer, and the hard mask layer is removed. |
| priorityDate |
2019-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |