| abstract |
The invention refers to a liquid photocurable resin composition for stereolithography, comprising (i) at least one radical polymerizable compound (A) represented by the following general formula (I): R4O—CO—NH—R2—NH—CO—O—R1—O—CO—NH—R3—NH—CO—OR4 (I), wherein R1 is a linear or branched polytetramethylene glycol residue having an average molecular weight from 200 to 3,000 g/mol; R2 is a diisocyanate compound residue; R3 is a diisocyanate compound residue being the same as or different from R2; and R4 is selected from AcrO—CH2—CH2—, (AcrO—CH2)2CH—, (AcrO—CH2)3C—CH2—, AcrO—CH2—CHCH3—, AcrO—CH2—CHC2H5— and (AcrO—CH2)2C(C2H5)CH2—, preferably from AcrO—CH2—CH2— and (AcrO—CH2)2CH—, more preferably is AcrO—CH2—CH2—; wherein Acr is CH2═C(R)—CO— and R is a hydrogen atom or a methyl group; (ii) at least one radically polymerizable organic compound (B) different from compound (A); and (iii) a photosensitive radical polymerization initiator (C), wherein the content of said radical polymerizable compound (A) varies from 5% to 70% by weight based on the total amount of compounds (A) and (B). The invention further describes a corresponding stereolithographic use and method and three-dimensional articles produced therewith. |