http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11037289-B2

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filingDate 2019-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_896f4030bd1c6c66b6e743ad83617a7d
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publicationDate 2021-06-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-11037289-B2
titleOfInvention Method and system for scanning wafer
abstract The present disclosure provides a method and a system for scanning wafer. The system captures a defect image of a wafer, and generates a reference image corresponding to the first defect image based on a reference image generation model. The system generates a defect marked image based on the defect image and the reference image.
priorityDate 2018-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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