Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_cc17ad004a5420e3036c65ffa30b6bd5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_184ab6cc393cfc24516974b6d269f7e5 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eb2648e65ad8850515bd727a122f1186 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89356f1853f247869329f1e21378c42c |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45536 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F17-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45553 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F17-00 |
filingDate |
2017-04-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2021-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b6fd2b7bfd46827e1c03a18b5d31afa2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_defbb9b1f70aba5d454d2b6b7f2d22bb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7fa2ee170db6b36df7c3f0c2f218f832 |
publicationDate |
2021-05-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-11008351-B2 |
titleOfInvention |
Methods for vapor deposition of group 4 transition metal-containing films using Group 4 transition metal-containing films forming compositions |
abstract |
Disclosed are methods of using Group 4 transition metal azatrane precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes. |
priorityDate |
2016-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |