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filingDate 2018-10-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10991876-B2
titleOfInvention Methods to improve magnetic tunnel junction memory cells by treating native oxide
abstract Methods of forming magnetic tunnel junction (MTJ) memory cells used in a magneto-resistive random access memory (MRAM) array are provided. A pre-clean process is performed to remove a metal oxide layer that may form on the top surface of the bottom electrodes of MTJ memory cells during the time the bottom electrode can be exposed to air prior to depositing MTJ layers. The pre-clean processes may include a remote plasma process wherein the metal oxide reacts with hydrogen radicals generated in the remote plasma.
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