| abstract |
The invention provides a composition comprising a first ethylene-based polymer, formed by a high pressure, free-radical polymerization process, and comprising the following properties:n a) a Mw(abs) versus I2 relationship: Mw(abs)<A×[(I2) B ], where A=5.00×10 2 (g/mole)/(dg/min) B , and B=−0.40; and b) a MS versus I2 relationship: MS≥C×[(I2) D ], where C=13.5 cN/(dg/min) D , and D=−0.55. |