http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10955740-B2

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filingDate 2017-06-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b309dcf965a9bcf8c41c48396a4fc5cd
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publicationDate 2021-03-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10955740-B2
titleOfInvention Pellicle frame and pellicle
abstract The present invention provides; a pellicle frame which can effectively inhibit distortion of the photo mask (8) caused by mounting the pellicle (1), and which does not have a complex shape, and a pellicle which uses said pellicle frame are provided, and a manufacturing method of a blackened pellicle frame is also provided which can reduce the defect of the surface flickering under concentrated light and which facilitates inspection of the foreign matter adhesion prior to use. The present invention relates to a pellicle frame with an anodized film on a surface of an aluminum alloy frame, characterized in that: the aluminum alloy frame comprises an aluminum alloy which contains Ca: 5.0 to 10.0% by mass with the remainder aluminum and unavoidable impurities are contained, and has an area (volume) ratio of an Al4Ca phase, which is a dispersed phase, is greater than or equal to 25%, and a crystal structure of a part of the Al4Ca phase is monoclinic; wherein the Al4Ca phase dispersed in the anodized film is anodized, and the anodized film is stained with a black dye.
priorityDate 2016-07-12-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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