Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_36333273e27f0db23ddddbf80ba79ba7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_13c11160cdfd337768026806b94febf6 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0217 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76883 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02164 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02167 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76885 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53228 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76897 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53295 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-5226 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76877 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53209 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76834 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76832 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-53257 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76816 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31111 |
classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-311 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-528 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-522 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-768 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-532 |
filingDate |
2017-06-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5eca75fa221128a0626b889cd7b96d4f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cb712321e348ed531c25ae96ff9bba29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bab1c5aed4aa1b0bbeca16070d34bca3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ad1480e1ca9983f0c0d2436922488f3f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b851788e9b2d2c4476b41662a2d672ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5104e78c9774470bcdffa9d9bfc53d41 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d249cd82b136aaf29b020442b78da7a8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ba522acba07bcabd5d18d8d6087012e9 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b893ba37e9ed2cfb774d797755e30d68 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_365956e4b5fa1ce99076c7a9d2e1e817 |
publicationDate |
2020-12-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10879120-B2 |
titleOfInvention |
Self aligned via and method for fabricating the same |
abstract |
A self aligned via and a method for fabricated a semiconductor device using a double-trench constrained self alignment process to form the via. The method includes forming a first trench and depositing a first metal into the first trench. Afterwards, the process includes depositing a dielectric layer over the first metal such that a top surface of the dielectric layer is at substantially the same level as the top surface of the first trench. Next, a second trench is formed and a via is formed by etching the portion of the dielectric layer exposed by the overlapping region between the first trench and the second trench. The via exposes a portion of the first metal and a second metal is deposited into the second trench such that the second metal is electrically coupled to the first metal. |
priorityDate |
2016-11-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |