http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10824075-B2
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_88f6119845609835b613468307fb4a5a |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10T428-13 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2053 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N27-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 |
| filingDate | 2018-05-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| grantDate | 2020-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b35c1489803d136763c93e4e3f719eb http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_83e006f93d5e3ba56c4063a8223e4f4d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_39958001d5ae047d207db954360ce9d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fd71400e55775e32bfdaefb96a1eb994 |
| publicationDate | 2020-11-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | US-10824075-B2 |
| titleOfInvention | Photolithography for making electrochemical measurements |
| abstract | An apparatus for electrochemical experimentation with an isolated microstructural region on a surface comprising a metal sample coated with a photoresist, a region of interest, a light source, comprising optoelectronic devices such as spatial light modulators or digital micromirror devices for direct modulation of the light distribution itself and avoiding the use of a mask, wherein the exposed region is created by light from the light source and wherein the metal sample is immersed. A method for isolating microstructural regions or features on a surface for electrochemical experimentation comprising the steps of providing a metal sample, coating the metal sample, selecting a region of interest, creating exposed photoresist with direct modulation of the light distribution itself by optoelectronic devices such as spatial light modulators or digital micromirror devices and without a mask. |
| priorityDate | 2011-09-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 26.