Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1bac30e2e0d9b1032666a455becfc383 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0582 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-1173 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K2203-013 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0002 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L51-0005 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-13 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K71-135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2018 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-0023 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B41M5-0058 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0017 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-0079 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H05K3-061 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-101 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09D11-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B41M5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L51-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 |
filingDate |
2016-07-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c110c883fb204315ae3a61ec50b03592 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abd91be525a1f989075f8cf7fb2808ec |
publicationDate |
2020-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10806035-B2 |
titleOfInvention |
Methods for producing an etch resist pattern on a metallic surface |
abstract |
A method of forming a metallic pattern on a substrate is provided. The method includes applying onto a metallic surface, a chemically surface- activating solution having an activating agent that chemically activates the metallic surface; non-impact printing an etch-resist ink on the activated surface to produce an etch resist mask according to a predetermined pattern, wherein at least one ink component within the etch-resist ink undergoes a chemical reaction with the activated metallic surface to immobilize droplets of the etch-resist ink when hitting the activated surface; performing an etching process to remove unmasked metallic portions that are not covered with the etch resist mask; and removing the etch resist mask. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11255018-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2020325583-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11425822-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2022136113-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11606863-B2 |
priorityDate |
2015-08-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |