Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_218fecbdba2d86089e4a23e02fe74701 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02T10-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2900-1812 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2610-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2610-144 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2610-1453 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2610-1433 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2900-1822 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N2900-1808 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/F01N3-208 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/F01N3-20 |
filingDate |
2018-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
grantDate |
2020-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1d35fcceffae5265e2736e60236347f http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4e5147cc6265ee522c0e3645bbee00d4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_23fb9cd8aefad18a84787276089924f7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2842bb927d963e9b45e07a8525f93b9a |
publicationDate |
2020-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
US-10753254-B2 |
titleOfInvention |
Reductant insertion assemblies including multiple metering assemblies and a single pump |
abstract |
A reductant insertion assembly for inserting a reductant into an aftertreatment system comprises a pump assembly including a pump. A first metering assembly is fluidly coupled to the pump. A second metering assembly is fluidly coupled to first metering assembly in series with the pump. The pump is configured to pump the reductant to the first metering assembly, and to the second metering assembly via the first metering assembly, such that a first reductant pressure in the first metering assembly is equal to a second reductant pressure in the second metering assembly. |
priorityDate |
2018-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |