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filingDate 2016-10-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e9381f8c08489f5e461d31bae94a077
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publicationDate 2020-08-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10753007-B2
titleOfInvention Process for indium or indium alloy deposition and article
abstract The present invention deals with a process for deposition of indium or indium alloys and an article obtained by the process, wherein the process includes the stepsn i. providing a substrate having at least one metal or metal alloy surface; ii. depositing a first indium or indium alloy layer on at least one portion of said surface whereby a composed phase layer is formed of a part of the metal or metal alloy surface and a part of the first indium or indium alloy layer; iii. removing partially or wholly the part of the first indium or indium alloy layer which has not been formed into the composed phase layer; iv. depositing a second indium or indium alloy layer on the at least one portion of the surface obtained in step iii.
priorityDate 2015-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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