http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10741380-B2

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_25ba42e5f214f100f81e5e2016f045ce
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-4405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67028
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-67
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-44
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
filingDate 2018-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
grantDate 2020-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8ea754e2cd0a28920a117e617abed444
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e57cccb06113e571439d16c1eb4b3bbc
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1a50d2e2fe48e07b2c0f8117ab538c00
publicationDate 2020-08-11-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber US-10741380-B2
titleOfInvention Method for washing semiconductor manufacturing apparatus component, apparatus for washing semiconductor manufacturing apparatus component, and vapor phase growth apparatus
abstract A method for washing a semiconductor manufacturing apparatus component, the method comprising: a first process of disposing a semiconductor manufacturing apparatus component, to which a nitride semiconductor adheres, in a component holding portion inside a reaction tank of a washing apparatus; a second process of introducing a halogen-containing gas from a gas introducing pipe into the reaction tank to remove the nitride semiconductor adhered to the semiconductor manufacturing apparatus component; a third process of trapping a reaction product generated by a reaction of the halogen-containing gas and the nitride semiconductor in a trapping unit; and a fourth process of discharging the reaction product trapped by the trapping unit from a gas discharging pipe to outside of the reaction tank.
priorityDate 2011-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2002185068-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2010273290-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005524529-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003216041-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03095239-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201104743-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011079251-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2008064109-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007004808-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2009050057-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2005047927-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2011052833-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2010129183-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2006275937-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-2003213562-A1
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID25135
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419547014
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419519717
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6327210
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID426098976
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419518429
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9999
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID26010
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415712843
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID61330

Total number of triples: 46.